The MIRA3 configurations include LM, XM and GM chamber sizes with optimised geometry capable of both low and high vacuum operations.
Features:
- High Brightness Schottky emitter for imaging in
High Resolution
High Current
Low Noise modes.
- Unique "Wide Field Optics" design with a proprietary Intermediate Lens (IML) offering a different kind of working and displaying modes, for enhanced field of view or depth of focus.
- Real-time "In-Flight Beam Tracing" for performance and optimization of beam, that also allows direct and continuous control of the beam and beam current "Beam Deceleration Technology" (BDT) for excellent resolution at low beam voltages.
- Powerful "In-Beam detector" provides Excellent imaging at short working distances. (optional).
- All MIRA3 chambers using a 5-axis fully motorized Compucentric Stage that provide superior specimen handling and have ideal geometry for EDX and EBSD.
- Extra-large chambers (XM, GM) with robust stages able to accommodate large samples including large wafers (15, 20, 30 Cm) (Optional).
- Numerous interface ports with optimized analytical geometry for attaching EDX, WDX and EBSD detectors.
- Many variable pressure modes for investigation of non-conductive samples.
- Several suspension type for chamber to ensure effective reduction of ambient vibrations in the laboratory.