The Q150T is available in three formats: sputtering, carbon evaporation or both. Depending upon the selected configuration, the Q150T can be a top-of-the-range sputter coater for high resolution scanning electron microscopy (SEM), a carbon coater suitable for SEM and transmission electron microscopy (TEM).
It has ability to sputter a wide selection of oxidising and non-oxidising metals. As an options Metal evaporation and aperture cleaning are available.
The vacuum chamber has an internal diameter of 165 mm/6” and comes with an integral implosion guard. The Q150T also includes ‘vacuum shutdown’, which enhances vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.
Key features
- Metal sputtering or carbon evaporation, or both - combined in one space-saving design
- Fine grain sputtering - ideal for high resolution FE-SEM
- High vacuum turbo pumping - allows sputtering of a wide range of oxidising and non-oxidising metals - suitable for W-SEM, FE-SEM and also for many thin film applications
- High vacuum carbon coating - ideal for SEM and TEM carbon coating
- Controlled ramped carbon rod evaporation - precise control and superior carbon films
- Pulsed or ramped carbon coating modes - ramped evaporation can be selected for enhanced control and reproducibility of deposited carbon
- Glow discharge, metal evaporation and aperture cleaning options
- Fully automatic touch screen control - rapid data input, simple operation
- Easy-to-change, drop-in style specimen stages (rotation stage as standard)
- Vacuum shut-down feature - leaves the process chamber under vacuum when not in use to give improved vacuum performance
- Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum (rest periods automatically built in)
- Extended warranty option